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용 도
High Temperature Hotplate는 Perovskite Solar Cell 및 Dye-Sensitized Solar Cell을 제작하는 과정에서 TiO2 나노 입자의 반도체 박막을 형성하는데 공정 장비로 사용되며 Plate를 가열하여 장비 표면에 600°C 이하의 온도를 가하여 유기물 및 Solvent 등을 제거하고 반도체 박막을 형성하는데 사용하는 장비입니다.
현재 많은 연구기관 및 대학교 연구실, 기업 등에서 사용하고 있는 Lab. 장비입니다.
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DESCRIPTION & BENEFITS
The High Temperature Hotplate (with Programmer) provides a consistent, controllable and reliable heat source for the firing of small working and counter electrodes for the production of test cells.
The High Temperature Hotplate (with Programmer) includes ramp timing and temperature controls. The key benefit to users of the High Temperature Hotplate (with Programmer) is that it can be programmed to precisely control the machine – an essential factor for achieving consistent, reliable results. Up to 32 temperature steps can be programmed and each temperature step can incorporate a ramp time or constant temperature time.
The High Temperature Hotplate surface is high quality Titanium plating; it is also highly robust and durable for use in any busy lab.
The High Temperature Hotplate is available in the covered and uncovered configuration
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